model

Ion etching machine 7.5IBE

Ion etching machine 10IBE

Ion Etching Machine 20IBE-C

Ion Etching Machine 20IBE-J

scope of application

Suitable for research institutes and laboratory research

Suitable for small-scale production and laboratory research

Ionic etching machine suitable for medium scale mass production

Ionic etching machine suitable for large-scale production use

Substrate Size

Φ 4 X 1 piece or
Φ 6 X 1 piece

Φ 8 X 1 piece

Φ 3 inch X 8 pieces
4 inch X 6 pieces
Φ 8 inch X 1 piece

Φ 4 inch X 12 pieces
Φ 5 inch X 10 pieces
6 inch X 8 pieces

ion source

8cm or 10cm
kaufman ion source

10cm Kaufmann ion source

20cm Kaufmann ion source

20cm Kaufmann ion source