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Fully automatic atomic force microscope AFM5500M
The AFM5500M is a fully automatic atomic force microscope with significantly improved operability and measurement accuracy, equipped with a 4-inch aut
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Fully automatic atomic force microscope AFM5500M

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全自动型原子力显微镜 AFM5500M

The AFM5500M is a fully automatic atomic force microscope with significantly improved operability and measurement accuracy, equipped with a 4-inch automatic motor stage. The equipment provides a fully automatic operation platform for cantilever replacement, laser alignment, testing parameter settings, and other processes. The newly developed high-precision scanner and low-noise 3-axis sensor significantly improve measurement accuracy. Moreover, the SEM-AFM shared coordinate sample stage enables easy mutual observation and analysis within the same field of view.

CL SLD Auto SIS RealTune®II

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Production company: Hitachi High Tech

  • characteristic

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  • Application data

characteristic

1. Automation function

  • Highly integrated automation functions pursue efficient detection
  • Reduce human error in detection

4英寸自动马达台
4-inch automatic motor table

自动更换悬臂功能
Automatic replacement of cantilever function

2. Reliability

Eliminate errors caused by mechanical reasons

Large scale horizontal scanning
Atomic force microscopy using a tube scanner typically obtains planar data through software calibration for the curved surfaces generated by the scanner's circular motion. However, using software correction methods cannot completely eliminate the influence of scanner arc motion, and distortion effects often occur in images.
The AFM5500M is equipped with the latest developed horizontal scanner, which can achieve accurate testing without being affected by circular motion.

Sample :Amorphous silicon thin film on a silicon substrate

Sample :Amorphous silicon thin film on a silicon substrate

High precision angle measurement
The scanner used in ordinary atomic force microscopes undergoes crosstalk when vertically stretched and contracted. This is the direct cause of morphological errors in the horizontal direction of the image.
The new scanner installed in AFM5500M does not bend (crosstalk) in the vertical direction and can obtain correct images without distortion in the horizontal direction.

Textured-structure solar battery

Sample : Textured-structure solar battery(having symmetrical structure due to its crystal orientation.)

  • *When using AFM5100N (open-loop control)

3. Integration

Intimate fusion with other detection and analysis methods

Through the shared coordinate sample stage of SEM-AFM, it is possible to quickly observe and analyze the surface morphology, structure, composition, physical properties, etc. of the sample in the same field of view.

Correlative AFM and SEM Imaging

SEM-AFM Observation Example in the Same Field of View (Sample: Graphene/SiO)2

The ovrlay images createed

The ovrlay images createed by using AZblend Ver.2.1, ASTRON Inc.

The above figure shows the application data of the shape image (AFM image) and potential image (KFM image) captured by AFM5500M, respectively, overlaid with SEM images.

  • By analyzing AFM images, it can be determined that SEM contrast characterizes the thickness of graphene layers.
  • The different layers of graphene result in a contrast in surface potential (work function).
  • The contrast of SEM images is different, and the reason can be found through high-precision 3D morphology measurement and physical property analysis of SPM.

In the future, we plan to integrate with other microscopes and analytical instruments.

parameter

AFM5500M host
Madatai Automatic precision motor table
Maximum observation range: 100 mm (4 inches) full field
Motor table movement range: XY ± 50 mm, Z ≥ 21 mm
Minimum step distance: XY 2 µ m, Z 0.04 µ m
Maximum sample size Diameter: 100 mm (4 inches), Thickness: 20 mm
Sample weight: 2 kg
Scan range 200 µ m x 200 µ m x 15 µ m (XY: closed-loop control/Z: sensor monitoring)
RMS noise level* 0.04 nm or less (high-resolution mode)
Reset accuracy* XY: ≤ 15 nm (standard spacing of 3 σ, measuring 10 μ m)/Z: ≤ 1 nm (standard depth of 3 σ, measuring 100 nm)
XY right angle ±0.5°
BOW* Below 2 nm/50 µ m
detection Laser detection (low interference optical system)
optical microscope Magnification: x1~x7
Field of view: 910 µ m x 650 µ m~130 µ m x 90 µ m
Display magnification: x465~x3255 (27 inch monitor)
Shock absorber platform Desktop active shock absorber platform 500 mm (W) x 600 mm (D) x 84 mm (H), approximately 28 kg
Soundproof cover 750 mm(W) x 877 mm (D) x 1400 mm(H)、 About 237 kg
Size and weight 400 mm(W) x 526 mm(D) x 550 mm(H)、 About 90 kg
  • *Parameters are related to device configuration and placement environment.
AFM5500M specialized atomic force microscope workstation
OS Windows7
RealTune ® II Automatic adjustment of cantilever amplitude, contact force, scanning rate, and signal feedback
Operation screen Operation navigation function, multi window display function (testing/analysis), 3D image overlay function, scanning range/measurement history display function, data batch analysis function, probe evaluation function
X. Y, Z scan driving voltage 0~150 V
Real time testing (pixel points) 4 screens (maximum 2048 x 2048)
2 screens (maximum 4096 x 4096)
Rectangular scan 2: 1. 4:1, 8:1, 16:1, 32:1, 64:1, 128:1, 256:1, 512:1, 1024:1
Analysis software 3D display function, roughness analysis, cross-sectional analysis, average cross-sectional analysis
Automatic control function Automatic replacement of cantilever and automatic laser alignment
Size and weight 340 mm(W) x 503 mm(D) x 550 mm(H)、 About 34 kg
Power Supply AC100~240 V ± 10% AC
Test mode Standard configuration: AFM, DFM, PM (phase), FFM Optional: SIS morphology, SIS physical characteristics LM-FFM、VE-AFM、Adhesion、Current、Pico-Current、SSRM、PRM、KFM、EFM(AC)、EFM(DC)、MFM
  • *WINDOWS is a registered trademark of Microsoft Corporation in the United States and other countries outside the United States.
  • *RealTune is a registered trademark of Hitachi, Ltd. in Japan, the United States, and Europe.
Optional: SEM-AFM Combined System
Applicable Hitachi SEM models SU8240, SU8230 (H36 mm type), SU8220 (H29 mm type)
Sample table size 41 mm(W) x 28 mm(D) x 16 mm (H)
Maximum sample size Φ20 mm x 7 mm
Centering accuracy ± 10 µ m (AFM centering accuracy)

Movie

Application data

  • SEM-SPM shared coordinate method for observing graphene/SiO2 in the same field of view2(PDF format, 750kBytes)

Application Data

Introduce the application data of scanning probe microscopy.

describe

Explain the principles and various states of scanning tunneling microscopy (STM) and atomic force microscopy (AFM).

History and SPM Development

Describe the history and development of our scanning probe microscope and our equipment. (Global site)

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Successful operation!

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